development process. Structural depth can be defined either by ion range or by material thickness. Aspect ratios up to several 10⁴ can be reached. The technique can shape and texture materials at a defined inclination angle. Random pattern, single-ion track structures and an aimed pattern consisting of individual single tracks can be generated.

X-ray lithography is a process used in the electronic industry to selectively remove parts of a thin film. It uses X-rays to transfer a geometric