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<p> InP substrates.Single crystal material in thin-film form can be grown by epitaxy from the liquid-phase (LPE), vapour-phase (VPE), by <a href="page.php?w=molecular_beam_epitaxy">molecular beam epitaxy</a> (MBE), and by <a href="page.php?w=metalorganic_chemical_vapour_deposition">metalorganic chemical vapour deposition</a> (MO-CVD).  Today, most commercial devices are produced by MO-CVD or by MBE.</p>

<p>The optical and mechanical properties of InGaAs can be varied by changing the ratio of InAs and GaAs, . Most InGaAs devices are grown on indium</p><p>
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