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<a accesskey="3" href="page.php?w=chemical_vapor_deposition&amp;p=2">3.Next</a>
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<p><b>Chemical vapor deposition</b> (<b>CVD</b>) is a <a href="page.php?w=thin_film">thin film</a> deposition method used to produce high-quality, and high-performance, solid materials. The process is often used in the <a href="page.php?w=semiconductor_industry">semiconductor industry</a> to produce electrically conductive layers in the range of a few 100 nm up to a few um.</p>

<p>In typical CVD, the <a href="page.php?w=wafer_%28electronics%29">wafer</a> (substrate) is exposed to one or more <a href="page.php?w=Volatility_%28chemistry%29">volatile</a></p><p>
<a accesskey="3" href="page.php?w=chemical_vapor_deposition&amp;p=2">3.Next</a>
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